Products &

TΛNDUO - Single Wafer Plasma Dry Strip System


  • product image
  • TΛNDUO offers dramatically improved throughput using a totally redesigned platform. Incorporating KOKUSAI ELECTRIC's production-proven Lambda Series plasma source, TΛNDUO offers an ultra high speed ashing process solution with minimum plasma damage and lowest CoO, compared with other available solutions.

    *TΛNDUO is a registered trademark of KOKUSAI ELECTRIC CORPORATION.

    Process Applications
    Resist Strip
    • Bulk Photoresist Strip
    • High-Dose Implant Strip
    Low Temperature Anneal


  • High throughput
  • High rate, damage free ashing with helical resonator type plasma source
  • Low Contamination
  • Compact Footprint
  • Other applications include high throughput single wafer annealing