TΛNDUO - Single Wafer Plasma Dry Strip System
TΛNDUO offers dramatically improved throughput using a totally redesigned platform. Incorporating KOKUSAI ELECTRIC's production-proven Lambda Series plasma source, TΛNDUO offers an ultra high speed ashing process solution with minimum plasma damage and lowest CoO, compared with other available solutions.
*TΛNDUO is a registered trademark of KOKUSAI ELECTRIC CORPORATION.
- Process Applications
- Bulk Photoresist Strip
- High-Dose Implant Strip
- Low Temperature Anneal
- High throughput
- High rate, damage free ashing with helical resonator type plasma source
- Low Contamination
- Compact Footprint
- Other applications include high throughput single wafer annealing