MARORA Single Wafer Plasma Nitridation / Oxidation System
MARORA offers the best gate dielectric film solution for next generation advanced logic and memory devices. This tool uses a unique "modified magnetron typed (MMT)" plasma source. MMT technology produces both high density plasma and low electron temperature (<1eV) enabling a very uniform nitridation process free of plasma damage.
*MARORA is a registered trademark of KOKUSAI ELECTRIC CORPORATION.
- Process Applications
- Oxide Nitridation
- Gate Dielectric
- Selective Oxidation
- Anisotropic Oxidation
- High Throughput: Doubled productivity compared with conventional solutions
- MMT Plasma Source: Excellent uniformity and very low electron temperature plasma at wafer surface (–1eV)
- Wide Process Temperature Range: New high temperature heater
- Expanded Process Applications: Selective oxidation (oxidize silicon without metal oxide formation)