VERTRON Batch Thermal Process System for 200mm Wafers
KOKUSAI ELECTRIC's Vertron-III series Batch Diffusion/LPCVD systems have been developed specifically for processing 200mm wafers predominantly used in high-volume semiconductor device manufacturing. The Vertron-III platform offers solid reliability and superior cost of ownership (CoO).
*VERTORON is a registered trademark of KOKUSAI ELECTRIC CORPORATION.
- Process Applications
- LP CVD
- Anneal (High Temp. / Low Temp.)
- High throughput, large batch (150Wafers)
- Reduced cycle time, optional fast ramp heater element which also lowers thermal budget
- Vacuum load lock available for oxygen and moisture sensitive process (lower oxygen & H2O concentration) (Option)
- User friendly GUI main system controller