Products &
Systems

Batch High Temperature Anneal Processing System

Overview

  • product image
  • This tool offers the best manufacturing solution for high-quality silicon substrate fabrication and high temperature device manufacturing processes. 1350°C is a typical temperature for high temperature annealing processes. Crystalline slip lines are easily induced on 300mm wafers processed at such high temperatures. This tool produces slip-free wafers at very high throughputs.

    Process Applications
    • High temperature Anneal
    • Very high temperature Anneal(>1300°C)

Features

  • Slip Free even at 1350°C
  • 300mm Wafer Capable
  • High Throughput Batch Processing
  • Ultra-Clean Design resulting in Low Metallic Contamination